Correction: Machine-learning-assisted screening of pure-silica zeolites for effective removal of linear siloxanes and derivatives

Date

2020

Authors

Lin, Shiru
Wang, Yekun
Zhao, Yinghe
Pericchi, Luis R.
Hernandez-Maldonado, Arturo J.
Chen, Zhongfang

Journal Title

Journal ISSN

Volume Title

Publisher

Royal Society of Chemistry

Abstract

As emerging organic contaminants, siloxanes have severe impacts on the environment and human health. Simple linear siloxanes and derivates, trimethylsilanol (TMS), dimethylsilanediol (DMSD), monomethylsilanetriol (MMST), and dimethylsulfone (DMSO2), are four persistent and common problematic compounds (PCs) from the hydroxylation and sulfuration of polydimethylsiloxanes. Herein, through a two-step computational process, namely Grand Canonical Monte Carlo (GCMC) simulations and machine learning (ML), we systematically screened 50 959 hypothetical pure-silica zeolites and identified 230 preeminent zeolites with excellent adsorption performances with all these four linear siloxanes and derivates. This work vividly demonstrates that the collocation of data-driven science and computational chemistry can greatly accelerate materials discovery and help solve the most challenging separation problems in environmental science.

Description

Article originally published by Journal of Materials Chemistry A, 8(13), 6372–6374. Published online 2020. https://doi.org/10.1039/d0ta90062a

Keywords

Emerging organic contaminants, Data-driven science, Environmental science

Citation

This is the published version of an article that is available at https://doi.org/10.3390/ecsa-9-13365. Recommended citation: Lin, S., Wang, Y., Zhao, Y., Pericchi, L. R., Hernández-Maldonado, A. J., & Chen, Z. (2020). Correction: Machine-learning-assisted screening of pure-silica zeolites for effective removal of linear siloxanes and derivatives. Journal of Materials Chemistry A, 8(13), 6372–6374. This item has been deposited in accordance with publisher copyright and licensing terms and with the author’s permission.